在传统存储产品方面,10nm以下DRAM制造工艺正成为主流,并逐步向7nm工艺突破,通过“FinFET架构+TSV技术”提升密度、降低功耗。3D NAND堆叠层数突破400层后,“垂直堆叠”难度加剧,厂商转向“水平扩展+架构优化”,比如三星V-NAND的阶梯式架构、Kioxia的BiCS架构,同时引入“HKC(高K介质+金属栅)”技术,解决高层数堆叠的漏电、散热问题,制造工艺从“层数竞赛”转向“架构+工艺”双重竞争。
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On Friday, the conflict seemed to escalate to a boiling point with Trump posting to Truth Social: “I am directing EVERY Federal Agency in the United States Government to IMMEDIATELY CEASE all use of Anthropic’s technology. We don’t need it, we don’t want it, and will not do business with them again!” The post went on to describe a six-month phaseout period and unspecified threats to Anthropic should it not cooperate.
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